Details

Autor(en) / Beteiligte

• Kiat Goh, Simon Chun
• Chuan, KaiLiang
• Tan, Chuan Seng

Titel

Effects of Triton X-n Surfactants on the Fabrication of Si (110) On-Chip Micromirrors

Ist Teil von

• 2018 International Conference on Optical MEMS and Nanophotonics (OMN), 2018, p.1-2

Ort / Verlag

IEEE

Erscheinungsjahr

2018

Quelle

IEEE Xplore

Beschreibungen/Notizen

• Micromirrors on silicon wafer are useful for directing light from one optical component to another. Fixed 45° mirrors on Si wafer are typically wet etched with surfactants. To date, one of the well documented surfactants is Triton X-100. This work attempts to study the effect of utilizing Triton X series surfactant, namely X-45, X-100 and X-405, with different chain length for Si etching in KOH to reveal Si (110). It is observed that longer chain length decreases etch depth but promotes a better (110) surface finish as compared to shorter chain length. However, (100) surface is smoother when etched in KOH with Triton X-45. Optical measurement was performed at \mathbf{1.55 \mu\mathbf{m}} with samples etched in 30% KOH and 10 ppm Triton X. The results reveals that longer chain length is preferred for obtaining smoother (110) mirror finish.