Details

Autor(en) / Beteiligte

• Ying Tang
• Yedave, Sharad
• Byl, Oleg
• Despres, Joseph
• Tien, Eric
• Bishop, Steve
• Sweeney, Joseph

Titel

Carbon Implantation Performance Improvement by Mixing Carbon Monoxide (CO) with Carbonyl Fluoride (COF2) and Carbon Dioxide (CO2)

Ist Teil von

• 2016 21st International Conference on Ion Implantation Technology (IIT), 2016, p.1-4

Ort / Verlag

IEEE

Erscheinungsjahr

2016

Quelle

IEEE Electronic Library Online

Beschreibungen/Notizen

• Co-implantation of impurities such as carbon (C) has been proven to effectively reduce Transient Enhanced Diffusion (TED) of boron during annealing, enabling the formation of high-quality ultra-shallow junctions - a requirement for advanced-node semiconductor devices. Carbon dioxide (CO 2 ) is traditionally used as the feed gas in implant tools for carbon implantation. Recently, carbon monoxide (CO) has been widely adopted as a replacement to CO 2 due to its lower oxygen content. To further improve the carbon implant performance, a mixture of CO, carbonyl fluoride (COF 2 ), and CO 2 is studied and reported in this paper. The effects of the additional fluorine and extra oxygen content from COF 2 or CO 2 are investigated. Our experiments show that with the right balance and mixture level of COF 2 and CO 2 , the carbon mixture can achieve improvements in key implant tool performance parameters, such as beam current and source life. Additionally, the CO/COF 2 /CO 2 mixture stability is studied, and a safe delivery package is described.