Details

Autor(en) / Beteiligte

• Ningning Jia
• Lam, Edmund Y

Titel

Performance analysis of pixelated source-mask optimization for optical microlithography

Ist Teil von

• 2010 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC), 2010, p.1-4

Ort / Verlag

IEEE

Erscheinungsjahr

2010

Link zum Volltext

• IEEE_Xplore

Quelle

IEEE Xplore Digital Library

Beschreibungen/Notizen

• The optical lithography is facing great challenge from the continuous shrinkage of the technology node. As one of the promising techniques, the free-form source-mask optimization (SMO) has been increasingly explored in recent years with great interests in the performance of SMO on its process robustness. In this paper, a free-form SMO framework is proposed, and its performance is tested by comparing the process window of SMO and the mask-only optimization.