Details

Autor(en) / Beteiligte

• Brizuela, F.
• Yong Wang
• Brewer, C.A.
• Pedaci, F.
• Weilun Chao
• Anderson, E.H.
• Yanwei Liu
• Goldberg, K.A.
• Naulleau, P.
• Wachulak, P.
• Marconi, M.C.
• Attwood, D.T.
• Rocca, J.J.
• Menoni, C.S.

Titel

13.2 nm table-top inspection microscope for extreme ultraviolet lithography mask defect characterization

Ist Teil von

• 2009 Conference on Lasers and Electro-Optics and 2009 Conference on Quantum electronics and Laser Science Conference, 2009, p.1-2

Ort / Verlag

IEEE

Erscheinungsjahr

2009

Quelle

IEEE Electronic Library (IEL)

Beschreibungen/Notizen

• We report on a reflection microscope that operates at 13.2-nm wavelength with a spatial resolution of 55 plusmn 3 nm. The microscope uses a table-top EUV laser to acquire images of photolithography masks in 20 seconds.