IEEE transactions on plasma science, 2009-04, Vol.37 (4), p.475-480
2009
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Details
- Autor(en) / Beteiligte
- Titel
- Excimer-Laser-Driven EUV Plasma Source for Single-Shot Projection Lithography
- Ist Teil von
- IEEE transactions on plasma science, 2009-04, Vol.37 (4), p.475-480
- Ort / Verlag
- New York, NY: IEEE
- Erscheinungsjahr
- 2009
- Quelle
- IEEE Electronic Library (IEL)
- Beschreibungen/Notizen
- We present a low-cost microexposure tool for projection lithography at 14.4 nm we have designed and operated at the ENEA Research Centre, Frascati. It is a laboratory-scale system based on a Schwarzschild-type projection optics which uses a laser-plasma soft X-ray source, equipped with a patented debris mitigation system in order to preserve the collector optics. As a preliminary result, we achieved a 90-nm optical resolution patterning on commercial resist. A sharp improvement in resolution size is expected when operating this tool by a large-output energy excimer laser in order to obtain a single-shot patterning.
- Sprache
- Englisch
- Identifikatoren
- ISSN: 0093-3813eISSN: 1939-9375DOI: 10.1109/TPS.2008.2011271Titel-ID: cdi_ieee_primary_4798212
- Format
- –
- Schlagworte
- Collectors, Debris, Exact sciences and technology, Excimer lasers, extreme ultraviolet (EUV) lithography, Integrated circuit technology, Laboratories, Laser theory, Laser-plasma interactions, laser-plasma sources, Lithography, Optical pulses, Optical resonators, Patterning, Physics, Physics of gases, plasmas and electric discharges, Physics of plasmas and electric discharges, Plasma production and heating, Plasma production and heating by laser beams, Plasma sources, Plasma x-ray sources, Preserves, Projection, Schwarzschild objective (SO), Ultraviolet sources, X-ray lasers, X-ray, gamma-ray and particle generation