Details

Autor(en) / Beteiligte

• Sarr, Mouhamadou
• Bahlawane, Naoufal
• Arl, Didier
• Dossot, Manuel
• McRae, Edward
• Lenoble, Damien

Titel

Atomic layer deposition of cobalt carbide films and their magnetic properties using propanol as a reducing agent

Ist Teil von

• Applied surface science, 2016-08, Vol.379, p.523-529

Ort / Verlag

Elsevier B.V

Erscheinungsjahr

2016

Link zum Volltext

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• [Display omitted] •Conformal carbon-Co-carbide thin films.•Chemically growth carbone-Co-carbide composite.•Tuneable magnetic properties. The investigation of highly conformal thin films using Atomic Layer Deposition (ALD) is driven by a variety of applications in modern technologies. In particular, the emergence of 3D memory device architectures requires conformal materials with tuneable magnetic properties. Here, nanocomposites of carbon, cobalt and cobalt carbide are deposited by ALD using cobalt acetylacetonate with propanol as a reducing agent. Films were grown by varying the ALD deposition parameters including deposition temperature and propanol exposure time. The morphology, the chemical composition and the crystalline structure of the cobalt carbide film were investigated. Vibrating Sample Magnetometer (VSM) measurements revealed magnetic hysteresis loops with a coercivity reaching 500Oe and a maximal saturation magnetization of 0.9T with a grain size less than 15nm. Magnetic properties are shown to be tuneable by adjusting the deposition parameters that significantly affect the microstructure and the composition of the deposited films.