Details

Autor(en) / Beteiligte

• Hellwig, O.
• Bosworth, J. K.
• Dobisz, E.
• Kercher, D.
• Hauet, T.
• Zeltzer, G.
• Risner-Jamtgaard, J. D.
• Yaney, D.
• Ruiz, R.

Titel

Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution

Ist Teil von

• Applied physics letters, 2010-02, Vol.96 (5)

Ort / Verlag

American Institute of Physics

Erscheinungsjahr

2010

Quelle

American Institute of Physics

Beschreibungen/Notizen

• Electron-beam (E-beam) directed assembly, which combines the long-range phase and placement registration of e-beam lithography with the sharp dot size and spacing uniformity of block copolymer self assembly, is considered highly promising for fabricating templates that meet the tight magnetic specifications required for write synchronization in bit patterned media magnetic recording systems. In our study, we show that this approach also yields a narrower magnetic switching field distribution (SFD) than e-beam patterning or block copolymer self-assembly alone. We demonstrate that the pattern uniformity, i.e., island diameter and placement distributions are also important for achieving tight magnetic SFDs.