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Ergebnis 5 von 1893

Details

Autor(en) / Beteiligte
Titel
Design and Characterization of 5 μm Pitch InGaAs Photodiodes Using In Situ Doping and Shallow Mesa Architecture for SWIR Sensing
Ist Teil von
  • Sensors (Basel, Switzerland), 2023-11, Vol.23 (22), p.9219
Ort / Verlag
Basel: MDPI AG
Erscheinungsjahr
2023
Link zum Volltext
Quelle
EZB Electronic Journals Library
Beschreibungen/Notizen
  • This paper presents the complete design, fabrication, and characterization of a shallow-mesa photodiode for short-wave infra-red (SWIR) sensing. We characterized and demonstrated photodiodes collecting 1.55 μm photons with a pixel pitch as small as 3 μm. For a 5 μm pixel pitch photodiode, we measured the external quantum efficiency reaching as high as 54%. With substrate removal and an ideal anti-reflective coating, we estimated the internal quantum efficiency as achieving 77% at 1.55 μm. The best measured dark current density reached 5 nA/cm2 at −0.1 V and at 23 °C. The main contributors responsible for this dark current were investigated through the study of its evolution with temperature. We also highlight the importance of passivation with a perimetric contribution analysis and the correlation between MIS capacitance characterization and dark current performance.
Sprache
Englisch
Identifikatoren
ISSN: 1424-8220
eISSN: 1424-8220
DOI: 10.3390/s23229219
Titel-ID: cdi_doaj_primary_oai_doaj_org_article_e277ef4a68194c43b6d4b8ea94d81d9c

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