Details

Autor(en) / Beteiligte

• Mayr, Sina
• Finizio, Simone
• Reuteler, Joakim
• Stutz, Stefan
• Dubs, Carsten
• Weigand, Markus
• Hrabec, Aleš
• Raabe, Jörg
• Wintz, Sebastian

Titel

Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples

Ist Teil von

• Crystals (Basel), 2021-05, Vol.11 (5), p.546

Ort / Verlag

Basel: MDPI AG

Erscheinungsjahr

2021

Quelle

EZB Electronic Journals Library

Beschreibungen/Notizen

• We employ xenon (Xe) plasma focused ion beam (PFIB) milling to obtain soft X-ray transparent windows out of bulk samples. The use of a Xe PFIB allows for the milling of thin windows (several 100 nm thick) with areas of the order of 100 µm × 100 µm into bulk substrates. In addition, we present an approach to empirically determine the transmission level of such windows during fabrication by correlating their electron and soft X-ray transparencies. We perform scanning transmission X-ray microscopy (STXM) imaging on a sample obtained by Xe PFIB milling to demonstrate the conceptual feasibility of the technique. Our thinning approach provides a fast and simplified method for facilitating soft X-ray transmission measurements of epitaxial samples and it can be applied to a variety of different sample systems and substrates that are otherwise not accessible.