Sie befinden Sich nicht im Netzwerk der Universität Paderborn. Der Zugriff auf elektronische Ressourcen ist gegebenenfalls nur via VPN oder Shibboleth (DFN-AAI) möglich. mehr Informationen...
Ergebnis 4 von 455

Details

Autor(en) / Beteiligte
Titel
Nanohollow Titanium Oxide Structures on Ti/FTO Glass Formed by Step-Bias Anodic Oxidation for Photoelectrochemical Enhancement
Ist Teil von
  • Nanomaterials (Basel, Switzerland), 2022-06, Vol.12 (11), p.1925
Ort / Verlag
Switzerland: MDPI AG
Erscheinungsjahr
2022
Link zum Volltext
Quelle
Electronic Journals Library
Beschreibungen/Notizen
  • In this study, a new anodic oxidation with a step-bias increment is proposed to evaluate oxidized titanium (Ti) nanostructures on transparent fluorine-doped tin oxide (FTO) on glass. The optimal Ti thickness was determined to be 130 nm. Compared to the use of a conventional constant bias of 25 V, a bias ranging from 5 V to 20 V with a step size of 5 V for 3 min per period can be used to prepare a titanium oxide (TiO ) layer with nanohollows that shows a large increase in current of 142% under UV illumination provided by a 365 nm LED at a power of 83 mW. Based on AFM and SEM, the TiO grains formed in the step-bias anodic oxidation were found to lead to nanohollow generation. Results obtained from EDS mapping, HR-TEM and XPS all verified the TiO composition and supported nanohollow formation. The nanohollows formed in a thin TiO layer can lead to a high surface roughness and photon absorbance for photocurrent generation. With this step-bias anodic oxidation methodology, TiO with nanohollows can be obtained easily without any extra cost for realizing a high current under photoelectrochemical measurements that shows potential for electrochemical-based sensing applications.
Sprache
Englisch
Identifikatoren
ISSN: 2079-4991
eISSN: 2079-4991
DOI: 10.3390/nano12111925
Titel-ID: cdi_doaj_primary_oai_doaj_org_article_7b75ced54186463d8ff8d8864772909a

Weiterführende Literatur

Empfehlungen zum selben Thema automatisch vorgeschlagen von bX