Materials, 2024-05, Vol.17 (10), p.2272
2024
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Details
- Autor(en) / Beteiligte
- Titel
- Zinc Oxide Nanostructure Deposition into Sub-5 nm Vertical Mesopores in Silica Hard Templates by Atomic Layer Deposition
- Ist Teil von
- Materials, 2024-05, Vol.17 (10), p.2272
- Ort / Verlag
- Switzerland: MDPI AG
- Erscheinungsjahr
- 2024
- Quelle
- EZB Electronic Journals Library
- Beschreibungen/Notizen
- Nanostructures synthesised by hard-templating assisted methods are advantageous as they retain the size and morphology of the host templates which are vital characteristics for their intended applications. A number of techniques have been employed to deposit materials inside porous templates, such as electrodeposition, vapour deposition, lithography, melt and solution filling, but most of these efforts have been applied with pore sizes higher in the mesoporous regime or even larger. Here, we explore atomic layer deposition (ALD) as a method for nanostructure deposition into mesoporous hard templates consisting of mesoporous silica films with sub-5 nm pore diameters. The zinc oxide deposited into the films was characterised by small-angle X-ray scattering, X-ray diffraction and energy-dispersive X-ray analysis.
- Sprache
- Englisch
- Identifikatoren
- ISSN: 1996-1944eISSN: 1996-1944DOI: 10.3390/ma17102272Titel-ID: cdi_doaj_primary_oai_doaj_org_article_5563dffe91ac4624b03942a450ce670c
- Format
- –
- Schlagworte
- atomic layer deposition, Atomic layer epitaxy, Electrochemical reactions, electrochemically assisted surfactant assembly, Electrodeposition, Electrodes, Energy dispersive X ray analysis, Ethanol, mesoporous silica, Metal oxides, Nanomaterials, Nanoparticles, Nanostructure, Nanostructured materials, Nanowires, Polyethylene terephthalate, Polymers, Pore size, Porous materials, Reproducibility, Silica, Silicon dioxide, small pores, Surfactants, Thin films, Vapor deposition, X ray analysis, X-ray scattering, Zeolites, Zinc industry, Zinc oxide, Zinc oxides