Details

Autor(en) / Beteiligte

• Barcons Ruiz, David
• Herzig Sheinfux, Hanan
• Hoffmann, Rebecca
• Torre, Iacopo
• Agarwal, Hitesh
• Kumar, Roshan Krishna
• Vistoli, Lorenzo
• Taniguchi, Takashi
• Watanabe, Kenji
• Bachtold, Adrian
• Koppens, Frank H. L.

Titel

Engineering high quality graphene superlattices via ion milled ultra-thin etching masks

Ist Teil von

• Nature communications, 2022-11, Vol.13 (1), p.6926-6926, Article 6926

Ort / Verlag

London: Nature Publishing Group

Erscheinungsjahr

2022

Link zum Volltext

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Abstract Nanofabrication research pursues the miniaturization of patterned feature size. In the current state of the art, micron scale areas can be patterned with features down to ~30 nm pitch using electron beam lithography. Here, we demonstrate a nanofabrication technique which allows patterning periodic structures with a pitch down to 16 nm. It is based on focused ion beam milling of suspended membranes, with minimal proximity effects typical to standard electron beam lithography. The membranes are then transferred and used as hard etching masks. We benchmark our technique by electrostatically inducing a superlattice potential in graphene and observe bandstructure modification in electronic transport. Our technique opens the path towards the realization of very short period superlattices in 2D materials, but with the ability to control lattice symmetries and strength. This can pave the way for a versatile solid-state quantum simulator platform and the study of correlated electron phases.