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Unprecedented thermal stability of inherently metastable titanium aluminum nitride by point defect engineering
Ist Teil von
Materials research letters, 2017-05, Vol.5 (3), p.158-169
Ort / Verlag
Taylor & Francis Group
Erscheinungsjahr
2017
Quelle
EZB Electronic Journals Library
Beschreibungen/Notizen
Extreme cooling rates during physical vapor deposition (PVD) allow growth of metastable phases. However, we propose that reactive PVD processes can be described by a gas-solid paraequilibrium defining chemical composition and thus point defect concentration. Weshow that this notion allows for point defect engineering by controlling deposition conditions. As example we demonstrate that thermal stability of metastable (Ti, Al) Nx, the industrial benchmark coating for wear protection, can be increased from 800 degrees C to unprecedented 1200 degrees C by minimizing the vacancy concentration. The thermodynamic approach formulated here opens a pathway for thermal stability engineering by point defects in reactively deposited thin films.