Details

Autor(en) / Beteiligte

• Galeano-Osorio, Diana Shirley
• Vargas, Santiago
• Ospina-Ospina, Rogelio
• Restrepo-Para, Elisabeth
• Arango, Pedro Jose

Titel

Carbon nitride films grown by cathodic vacuum arc for hemocompatibility applications

Ist Teil von

• Dyna (Medellín, Colombia), 2014-01, Vol.81 (186), p.94-101

Ort / Verlag

Bogota: Universidad Nacional de Colombia

Erscheinungsjahr

2014

Quelle

Free E-Journal (出版社公開部分のみ）

Beschreibungen/Notizen

• Amorphous carbon nitride films have been obtained by pulsed cathodic arc at substrate temperatures of 20, 100, 150 and 200 °C. Film structure was investigated by Fourier Transformed infrared spectroscopy (FTIR) and Raman spectroscopy. Nitrile bands at approximately 2200 cm-1 were identified in all films. As the temperature increased a reduction in the concentration of sp3 bonds and a decrease in the structure disorder were observed. The relative intensity ratio of Raman D and G bands increased as the substrate temperature increased from 20 to 100°C. Nevertheless, at a critical temperature of 150°C, this trend was broken, and the film became amorphous. A peak at approximately 1610 cm-1 of films grown at 100°C, 150°C and 200 °C suggests that CNx is dominated by a relatively ordered graphite ring like glassy carbon. Moreover, the film grown at 150 °C presented the lowest roughness and the highest hardness and hemocompatibility.