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Molecular Dynamics Simulation of Impurities in Nanocrystalline Diamond Grain Boundaries
Ist Teil von
MRS proceedings, 1999, Vol.593, Article 481
Ort / Verlag
New York, USA: Cambridge University Press
Erscheinungsjahr
1999
Beschreibungen/Notizen
Nanocrystalline diamond films grown on Si substrates at 800°C from hydrogen-poorplasmas have a number of highly desirable mechanical and electronic properties. Impurities were found by SIMS measurements to be uniformly distributed throughout the thickness of the films at a level of 1017–1018 cm−3. It is likely that the impurities are located at the grain boundaries, which play a crucial role in controlling important characteristics of the films, such as electrical conductivity and electron emission. Density-functional based tight-binding (DFTB) molecular dynamics simulations were performed for diamond high-energy high-angle (100) twist grain boundaries with impurities such as N, Si and H