Details

Autor(en) / Beteiligte

• YASUE, Tsuneo
• YOSHII, Hiroyuki
• KOSHIKAWA, Takanori

Titel

Hydrogen Termination Effect on the Growth of Cu/Si(111)

Ist Teil von

• Hyomen Kagaku, 1996/07/10, Vol.17(7), pp.401-405

Ort / Verlag

The Surface Science Society of Japan

Erscheinungsjahr

1996

Link zum Volltext

Quelle

EZB Electronic Journals Library

Beschreibungen/Notizen

• The hydrogen mediated growth process of Cu films on Si(111) surfaces is observed by medium energy ion scattering (MEIS), RHEED and AES. At room temperature, the role of hydrogen is not so prominent in the growth process. At high temperatures, however, formation of islands is observed. This indicates that the surface diffusion of Cu atoms is enhanced by the hydrogen termination.