IEEE transactions on plasma science, 2020-08, Vol.48 (8), p.2736-2741
2020
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Details
- Autor(en) / Beteiligte
- Titel
- Ion Number Density Quantification Utilizing Pulsing Frequency in Negative Differential Resistance (NDR) Regime of Microplasma Operation
- Ist Teil von
- IEEE transactions on plasma science, 2020-08, Vol.48 (8), p.2736-2741
- Ort / Verlag
- New York: IEEE
- Erscheinungsjahr
- 2020
- Quelle
- IEEE Electronic Library Online
- Beschreibungen/Notizen
- A mathematical model is presented for quantifying the ion number density over a range of discharge current in microplasma discharges. The ion number density is determined from measured discharge voltage, current, pulsing frequency, and trace impurity that is injected into the system deliberately. Experiments are conducted in pure helium with nitrogen being introduced as the trace species. The ion number density is estimated over a range of discharge current and is compared with multidimensional simulation results.
- Sprache
- Englisch
- Identifikatoren
- ISSN: 0093-3813eISSN: 1939-9375DOI: 10.1109/TPS.2020.3005882Titel-ID: cdi_crossref_primary_10_1109_TPS_2020_3005882
- Format
- –
- Schlagworte
- 70 PLASMA PHYSICS AND FUSION TECHNOLOGY, Computer simulation, Density, Discharge, Discharges (electric), Feeds, Helium, Impurities, Introduced species, Ion number density, Ionization, microplasma, Microplasmas, NDR, negative differential resistance, negative differential resistance (NDR), Plasmas, pulsing frequency, Temperature measurement, Trace impurities