Details

Autor(en) / Beteiligte

• Tang, Cen-Yao
• Rao, Zhi-Cheng
• Yuan, Qian-Qian
• Tian, Shang-Jie
• Li, Hang
• Huang, Yao-Bo
• Lei, He-Chang
• Li, Shao-Chun
• Qian, Tian
• Sun, Yu-Jie
• Ding, Hong

Titel

Atomically flat surface preparation for surface-sensitive technologies

Ist Teil von

• Chinese physics B, 2020-01, Vol.29 (2), p.28101

Erscheinungsjahr

2020

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Surface-sensitive measurements are crucial to many types of researches in condensed matter physics. However, it is difficult to obtain atomically flat surfaces of many single crystals by the commonly used mechanical cleavage. We demonstrate that the grind-polish-sputter-anneal method can be used to obtain atomically flat surfaces on topological materials. Three types of surface-sensitive measurements are performed on CoSi (001) surface with dramatically improved quality of data. This method extends the research area of surface-sensitive measurements to hard-to-cleave alloys, and can be applied to irregular single crystals with selective crystalline planes. It may become a routine process of preparing atomically flat surfaces for surface-sensitive technologies.