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Nonpolar
a
-plane GaN films were grown on nearly lattice-matched
a
-plane ZnO substrates by pulsed laser deposition. Growth of GaN on
a
-plane ZnO at conventional growth temperatures (around
700
°
C
) resulted in the formation of polycrystalline materials, probably due to the interface reactions between GaN and ZnO. However, single crystalline
a
-plane GaN with an atomically flat surface can be grown on ZnO at room temperature in the layer-by-layer mode. X-ray diffraction and photoluminescence measurements revealed that high-quality
a
-plane GaN films can also be grown at elevated substrate temperatures (up to
700
°
C
) by using a RT
a
-plane GaN film as a buffer layer.
Sprache
Englisch
Identifikatoren
ISSN: 0003-6951
eISSN: 1077-3118
DOI: 10.1063/1.2809361
Titel-ID: cdi_crossref_primary_10_1063_1_2809361
Format
–
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