Details

Autor(en) / Beteiligte

• Roy, R. A.
• Clevenger, L. A.
• Cabral, C.
• Saenger, K. L.
• Brauer, S.
• Jordan-Sweet, J.
• Bucchignano, J.
• Stephenson, G. B.
• Morales, G.
• Ludwig, K. F.

Titel

In   situ x-ray diffraction analysis of the C49–C54 titanium silicide phase transformation in narrow lines

Ist Teil von

• Applied physics letters, 1995-04, Vol.66 (14), p.1732-1734

Erscheinungsjahr

1995

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• The transformation of titanium silicide from the C49 to the C54 structure was studied using x-ray diffraction of samples containing arrays of narrow lines of preformed C49 TiSi2. Using a synchrotron x-ray source, diffraction patterns were collected at 1.5–2 °C intervals during sample heating at rates of 3 or 20 °C/s to temperatures of 1000–1100 °C. The results show a monotonic increase in the C54 transition temperature by as much as 180 °C with a decreasing linewidth from 1.0 to 0.1 μm. Also observed is a monotonic increase in (040) preferred orientation of the C54 phase with decreasing linewidth. The results demonstrate the power of in situ x-ray diffraction of narrow line arrays as a tool to study finite size effects in thin-film reactions.