Sie befinden Sich nicht im Netzwerk der Universität Paderborn. Der Zugriff auf elektronische Ressourcen ist gegebenenfalls nur via VPN oder Shibboleth (DFN-AAI) möglich. mehr Informationen...
Influence of passivating interlayers on the carrier selectivity of MoO x contacts for c-Si solar cells
Ist Teil von
EPJ Photovoltaics, 2024, Vol.15, p.34
Erscheinungsjahr
2024
Quelle
EZB Electronic Journals Library
Beschreibungen/Notizen
The application of molybdenum oxide (MoO x ) as a hole-selective contact for silicon-based solar cells has been explored due to superior optical transmittance and potentially leaner manufacturing compared to fully amorphous silicon-based heterojunction (SHJ) devices. However, the development of MoO x contacts has been hampered by their poor thermal stability, resulting in a carrier selectivity loss and an S-shaped IV curve. The aim of this study is to understand the influence of different passivating interlayers on the carrier selectivity of hole-selective MoO x contacts for crystalline silicon (c-Si) solar cells. We highlight the effect of different interlayers on the surface passivation quality, contact selectivity, and the thermal stability of our MoO x -contacted devices. The interlayers studied are intrinsic hydrogenated amorphous silicon (a-Si:H( i )), thermally grown ultrathin SiO 2 , and a stack consisting of an ultrathin SiO y and Al 2 O 3 layer. Additionally, we simulate the interacting interlayer properties on the carrier selectivity of our MoO x contacts using a simplified model. Among these interlayers, the Al 2 O 3 /SiO y stack shows to be a promising alternative to SiO 2 by enabling efficient transport of holes while being able to sustain an annealing temperature of at least 250 °C underlining its potential in module manufacturing and outdoor operation.