Details

Autor(en) / Beteiligte

• Dulcey, Charles S
• Georger, Jacque H
• Chen, Mu-San
• McElvany, Stephen W
• O'Ferrall, C. Elizabeth
• Benezra, Valarie I
• Calvert, Jeffrey M

Titel

Photochemistry and Patterning of Self-Assembled Monolayer Films Containing Aromatic Hydrocarbon Functional Groups

Ist Teil von

• Langmuir, 1996-03, Vol.12 (6), p.1638-1650

Ort / Verlag

Washington, DC: American Chemical Society

Erscheinungsjahr

1996

Link zum Volltext

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• The deep ultraviolet (λ < ∼250 nm) photochemistry of chemisorbed organosilane self-assembled films of the type R(CH2) n SiO−surface where n = 0, 1, 2 and R = phenyl, naphthyl, or anthracenyl is explored. Photochemistry is examined using 193 and 248 nm laser irradiation as well as deep ultraviolet lamp sources. It is demonstrated for a variety of systems, including single and multiple rings as well as heterocycles, that the primary photochemical mechanism is cleavage of the Si−C bond. Photocleavage of the organic group generates a polar, wettable silanol surface that is amenable to subsequent remodification by organosilane chemisorption, allowing the fabrication of high-resolution patterns of chemical functional groups in a single molecular plane. The use of patterned monolayers as templates of reactivity for subsequent selective chemical reactions is demonstrated.