Details

Autor(en) / Beteiligte

• Öfner, Helmut
• Zaera, Francisco

Titel

Surface Defect Characterization in Oxygen-Dosed Nickel Surfaces and in NiO Thin Films by CO Adsorption−Desorption Experiments

Ist Teil von

• The journal of physical chemistry. B, 1997-10, Vol.101 (44), p.9069-9076

Ort / Verlag

American Chemical Society

Erscheinungsjahr

1997

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Oxygen-covered Ni(110) as well as thin NiO films grown by oxidation of that surface were characterized under ultrahigh vacuum by using low-energy electron diffraction (LEED), X-ray photoelectron (XPS), Auger (AES), and ion scattering (ISS) spectroscopies together with CO temperature-programmed desorption (TPD) titrations. Results from NiO(100) films with surface defects induced via Ar+ ion irradiation at room temperature were compared with those from partially oxidized ordered Ni(110) surfaces. CO TPD proved to be a useful local probe for the investigation of defective NiO surfaces, since its adsorption energy varies by over 20 kcal/mol in going from a metallic Ni(110) clean surface to NiO. The CO-probing experiments also revealed that Ar+ bombardment of thin NiO films leads to the formation of Ni−O phases similar to those found during the early oxidation stages of the Ni metal surface.