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Surface Defect Characterization in Oxygen-Dosed Nickel Surfaces and in NiO Thin Films by CO Adsorption−Desorption Experiments
Ist Teil von
The journal of physical chemistry. B, 1997-10, Vol.101 (44), p.9069-9076
Ort / Verlag
American Chemical Society
Erscheinungsjahr
1997
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
Oxygen-covered Ni(110) as well as thin NiO films grown by oxidation of that surface were characterized under ultrahigh vacuum by using low-energy electron diffraction (LEED), X-ray photoelectron (XPS), Auger (AES), and ion scattering (ISS) spectroscopies together with CO temperature-programmed desorption (TPD) titrations. Results from NiO(100) films with surface defects induced via Ar+ ion irradiation at room temperature were compared with those from partially oxidized ordered Ni(110) surfaces. CO TPD proved to be a useful local probe for the investigation of defective NiO surfaces, since its adsorption energy varies by over 20 kcal/mol in going from a metallic Ni(110) clean surface to NiO. The CO-probing experiments also revealed that Ar+ bombardment of thin NiO films leads to the formation of Ni−O phases similar to those found during the early oxidation stages of the Ni metal surface.
Sprache
Englisch
Identifikatoren
ISSN: 1520-6106
eISSN: 1520-5207
DOI: 10.1021/jp971854h
Titel-ID: cdi_crossref_primary_10_1021_jp971854h
Format
–
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