Details

Autor(en) / Beteiligte

• Acres, Robert G
• Ellis, Amanda V
• Alvino, Jason
• Lenahan, Claire E
• Khodakov, Dmitriy A
• Metha, Gregory F
• Andersson, Gunther G

Titel

Molecular Structure of 3-Aminopropyltriethoxysilane Layers Formed on Silanol-Terminated Silicon Surfaces

Ist Teil von

• Journal of physical chemistry. C, 2012-03, Vol.116 (10), p.6289-6297

Ort / Verlag

Columbus, OH: American Chemical Society

Erscheinungsjahr

2012

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• The use of the coupling agent, 3-aminopropyltriethoxysilane (APTES), in the silanization reaction with silanol-terminated silicon is an important surface modification reaction. Of particular importance is that the terminal amine functionalities of APTES are sufficiently exposed to the gas or liquid phase for further modifications, such as amide coupling reactions. Here, metastable induced electron spectroscopy (MIES) and UV photoelectron spectroscopy (UPS) were used to study the composition of the outermost layer of a silanol-terminated Si surface after silanization with APTES. High-resolution X-ray photoelectron spectroscopy (XPS) was used to validate the attachment of APTES to the surface. Density of States (DOS) calculations were employed for interpreting the MIE spectra. Findings showed that amine functionalities covered only a small fraction of the APTES-modified Si surface.