Details

Autor(en) / Beteiligte

• Jung, Yangho
• Yeo, Tae Hoon
• Yang, Wooseok
• Kim, Youngwoo
• Woo, Kyoohee
• Moon, Jooho

Titel

Direct Photopatternable Organic–Inorganic Hybrid Materials as a Low Dielectric Constant Passivation Layer for Thin Film Transistor Liquid Crystal Displays

Ist Teil von

• Journal of physical chemistry. C, 2011-12, Vol.115 (50), p.25056-25062

Ort / Verlag

American Chemical Society

Erscheinungsjahr

2011

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Direct photopatternable and highly cross-linked organosiloxane-based organic–inorganic hybrid materials (Lt-passimer) were synthesized using a sol–gel reaction of phenyltrimethoxysilane and tetraethyl orthosilicate as a low dielectric constant passivation layer for thin film transistor (TFT) liquid crystal displays (LCDs). Addition of hexa(methoxymethyl)melamine into the synthesized hybrid material resin minimizes the polar silanol group in Lt-passimer film by enhancing the cross-linking reaction and improves the thermal stability. The highly cross-linked siloxane network and low concentration of silanol groups cause the Lt-passimer film to have low dielectric constant (k ∼ 2.8) and excellent electrical insulation. Compared with the conventional photosensitive acryl film (k ∼ 3.2), our Lt-passimer films are optically transparent and have a relatively low outgassing and water vapor permeability, which proves the feasibility of Lt-passimer as a low dielectric constant passivation layer in high aperture ratio TFT-LCDs.