Thin solid films, 2012-04, Vol.520 (13), p.4219-4236
2012
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Details
- Autor(en) / Beteiligte
- Titel
- Atmospheric plasmas for thin film deposition: A critical review
- Ist Teil von
- Thin solid films, 2012-04, Vol.520 (13), p.4219-4236
- Ort / Verlag
- Amsterdam: Elsevier B.V
- Erscheinungsjahr
- 2012
- Quelle
- Alma/SFX Local Collection
- Beschreibungen/Notizen
- An overview of the possibilities of atmospheric plasma for the deposition of inorganic and organic coatings is presented. Some particularities of the atmospheric discharges and their consequences on the synthesis of films are presented and discussed.
- Sprache
- Englisch
- Identifikatoren
- ISSN: 0040-6090eISSN: 1879-2731DOI: 10.1016/j.tsf.2012.01.026Titel-ID: cdi_crossref_primary_10_1016_j_tsf_2012_01_026
- Format
- –
- Schlagworte
- APECVD, Atmospheric plasma, Cross-disciplinary physics: materials science, rheology, Deposition, Exact sciences and technology, Hybrid coatings, Inorganic coatings, Ion and electron beam-assisted deposition, ion plating, Materials science, Methods of deposition of films and coatings, film growth and epitaxy, Organic coatings, Physics, Physics of gases, plasmas and electric discharges, Physics of plasmas and electric discharges, Plasma applications, Plasma-based ion implantation and deposition, Plasma-polymerization