Details

Autor(en) / Beteiligte

• Hsieh, Ming-Hsiao
• Tsai, Ming-Hung
• Shen, Wan-Jui
• Yeh, Jien-Wei

Titel

Structure and properties of two Al–Cr–Nb–Si–Ti high-entropy nitride coatings

Ist Teil von

• Surface & coatings technology, 2013-04, Vol.221, p.118-123

Ort / Verlag

Amsterdam: Elsevier B.V

Erscheinungsjahr

2013

Quelle

ScienceDirect

Beschreibungen/Notizen

• Two high-entropy alloy nitride films, (Al23.1Cr30.8Nb7.7Si7.7Ti30.7)N50 and (Al29.1Cr30.8Nb11.2Si7.7Ti21.2)N50, were designed and prepared by reactive magnetron sputtering. The influences of substrate bias (from −50V to −150V) on chemical composition, microstructure, and mechanical properties of the deposited films were investigated. All the films have face-centered cubic NaCl-type structure. The (Al23.1Cr30.8Nb7.7Si7.7Ti30.7)Nx films deposited at −100V exhibit the highest hardness of 36.1GPa, and the (Al29.1Cr30.8Nb11.2Si7.7Ti21.2)Nx films have its maximum hardness of 36.7GPa at a substrate bias of −150V. Both (Al23.1Cr30.8Nb7.7Si7.7Ti30.7)Nx and (Al29.1Cr30.8Nb11.2Si7.7Ti21.2)Nx films have outstanding oxidation resistance at 900°C. ► Two non-equimolar high-entropy alloy nitride films were prepared. ► The effect of bias on microstructure and properties was studied. ► The films have high hardness and good oxidation resistance.