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E-TCT characterization of a thinned, backside biased, irradiated HV-CMOS pixel test structure
Ist Teil von
Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 2021-03, Vol.991, p.164949, Article 164949
Ort / Verlag
Elsevier B.V
Erscheinungsjahr
2021
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
This paper presents the results of edge-Transient Current Technique (e-TCT) measurements of a test structure of a High Voltage CMOS (HV-CMOS) pixel demonstrator, the H35DEMO. Several high resistivity (1000 Ω⋅cm) samples of the device were thinned to 100μm, processed for backside biasing, and irradiated with neutrons to fluences up to 2⋅1016neq⋅cm−2. The evolution of effective doping concentration with respect to fluence is studied. Samples irradiated to a fluence of 5⋅1014neq⋅cm−2 are fully depleted beyond −50V substrate bias voltage while samples irradiated to the highest fluence reach 30 μm depletion at −200V.