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•Au-induced crystallization of a-SiO0.2 films was carried out at 210–275 °C.•The activation energy for AuIC of a-SiO0.2 was determined for the first time to be 1.7 ± 0.1 eV.•Raman spectroscopy revealed the improvement of crystalline properties of poly-Si films with decreasing annealing temperature.•XRD revealed the formation of poly-Si with (111) crystallographic orientation.
Polycrystalline silicon (poly-Si) films were fabricated by gold-induced crystallization (AuIC) of amorphous silicon suboxide (a-SiOx, x = 0.2) films at temperatures of 210–275 °C. The films were studied by in situ optical microscopy, Raman spectroscopy, and X-ray diffractometry. The activation energy for AuIC of a-SiO0.2 was determined for the first time to be 1.7 ± 0.1 eV.