Details

Autor(en) / Beteiligte

• McMichael, R.D
• Atzmony, U
• Beauchamp, C
• Bennett, L.H
• Swartzendruber, L.J
• Lashmore, D.S
• Romankiw, L.T

Titel

Fourfold anisotropy of an electrodeposited Co/Cu compositionally modulated alloy

Ist Teil von

• Journal of magnetism and magnetic materials, 1992-07, Vol.113 (1), p.149-154

Ort / Verlag

Amsterdam: Elsevier B.V

Erscheinungsjahr

1992

Quelle

Elsevier Journal Backfiles on ScienceDirect (DFG Nationallizenzen)

Beschreibungen/Notizen

• A compositionally modulated alloy of 3 nm layers each of Cu and Co was electrodeposited on a (100) oriented Cu single crystal substrate. Anisotropy with fourfold symmetry in the plane of the film was investigated using ferromagnetic resonance, vector VSM techniques, and measurements of magnetic viscosity. This anisotropy is thought to be the first such effect to be observed in multilayered samples produced by either sputtering or electrodeposition. The anisotropy energy, K 1, is roughly consistent with values published for fcc cobalt.