Details

Autor(en) / Beteiligte

• Bilek, M. M. M.
• McKenzie, D. R.
• Tarrant, R. N.
• Oates, T. W. H.
• Ruch, P.
• Newton-McGee, K.
• Shi, Yang
• Tompsett, D.
• Nguyen, H. C.
• Gan, B. K.
• Kwok, D. T.

Titel

Practical Plasma Immersion Ion Implantation for Stress Regulation and Treatment of Insulators

Ist Teil von

• Contributions to plasma physics (1985), 2004-09, Vol.44 (5-6), p.465-471

Ort / Verlag

Berlin: WILEY-VCH Verlag

Erscheinungsjahr

2004

Quelle

Wiley Online Library - AutoHoldings Journals

Beschreibungen/Notizen

• Plasma immersion ion implantation has been attracting the interest of research groups around the world over the last two decades. The technique has been developed to the stage where it is a well‐established technique for a number of materials processing applications, such as plasma nitriding. Recent research has focussed on developing the method for a range of new applications, including stress regulation and control of microstructure, as well as surface treatment of insulators. Recent developments in these technologically important applications are discussed in this paper. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)