Details

Autor(en) / Beteiligte

• 郇庆 胡昊 潘理达 肖江 杜世萱 高鸿钧

Titel

Atomic force microscopy investigation of growth process of organic TCNQ aggregates on SiO2 and mica substrates

Ist Teil von

• Chinese physics B, 2010-08, Vol.19 (8), p.270-275

Ort / Verlag

IOP Publishing

Erscheinungsjahr

2010

Quelle

Alma/SFX Local Collection

Beschreibungen/Notizen

• Deposition patterns of tetracyanoquinodimethane （TCNQ） molecules on different surfaces are investigated by atomic force microscopy. A homemade physical vapour deposition system allows the better control of molecule deposition. Taking advantage of this system, we investigate TCNQ thin film growth on both SiO2 and mica surfaces. It is found that dense island patterns form at a high deposition rate, and a unique seahorse-like pattern forms at a low deposition rate. Growth patterns on different substrates suggest that the fractal pattern formation is dominated by molecule-molecule interaction. Finally, a phenomenal ＂two-branch＂ model is proposed to simulate the growth process of the seahorse pattern.